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Proceedings Paper

Nonlinear PI-control temperature control algorithm for projection lens
Author(s): Xiaoping Li; Hongfei Nie; Bin Yu
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Paper Abstract

Image quality is the most important performance of optical lithography tool and it is influenced by many factors. Temperature stability of projection lens is one of the main factors. It is difficult to control temperature stability of the projection lens because of its features of big inertia, multi-time-delay and multi-perturbation. Temperature control unit (TCU), which is used to control the projection lens temperature, is required to operate far away from projection lens, otherwise it will increase COO of lithography tool and its vibration will affect the performance of projection lens. So a remote temperature control method is proposed. A two-input and two-output intelligent algorithm is presented to improve convergent rate and steady-state accuracy of the temperature control system for projection lens. Control process is divided into five phases according to the ideal dynamic response curve. A nonlinear PI algorithm is recommended to precisely adjust temperature and an intelligent decision decides the switch of five multi-phases. The experiment results show that ±0.006°C temperature stability can be realized and the algorithm has advantage of quick convergent rate, strong robustness and self-adaptability. This algorithm has been used in optical lithography tool with 100nm CD and has achieved good temperature stability.

Paper Details

Date Published: 21 November 2007
PDF: 9 pages
Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 67241Q (21 November 2007); doi: 10.1117/12.782953
Show Author Affiliations
Xiaoping Li, Huazhong Univ. of Science and Technology (China)
Hongfei Nie, Huazhong Univ. of Science and Technology (China)
Bin Yu, Shanghai Micro Electronics Equipment Co., Ltd. (China)


Published in SPIE Proceedings Vol. 6724:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Sen Han; Tingwen Xing; Yanqiu Li; Zheng Cui, Editor(s)

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