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Proceedings Paper

Substrate patterning for passive matrix organic light-emitting devices by photolithography processing
Author(s): Jun Wang; Jun-sheng Yu; Hui Lin; Shuang-ling Lou; Ya-dong Jiang
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Paper Abstract

The fabrication technology of high resolution substrate pattern for organic light-emitting devices (OLEDs) was discussed in the paper. Surface morphology and crystallization properties of ITO films and the shape of photolithography pattern were investigated. Experimental results show that three factors including deposition pressure, flow ratio of argon to oxygen and annealing temperature greatly influence the conductance of ITO film.. Some attempts about designing photomask were enumerated and the reverse taper angle separator was successfully fabricated with image reversal process.

Paper Details

Date Published: 21 November 2007
PDF: 5 pages
Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 67241E (21 November 2007); doi: 10.1117/12.782855
Show Author Affiliations
Jun Wang, Univ. of Electronic Science and Technology of China (China)
Jun-sheng Yu, Univ. of Electronic Science and Technology of China (China)
Hui Lin, Univ. of Electronic Science and Technology of China (China)
Shuang-ling Lou, Univ. of Electronic Science and Technology of China (China)
Ya-dong Jiang, Univ. of Electronic Science and Technology of China (China)


Published in SPIE Proceedings Vol. 6724:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Sen Han; Tingwen Xing; Yanqiu Li; Zheng Cui, Editor(s)

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