Share Email Print
cover

Proceedings Paper

Time-resolved dynamics of 355-nm laser-irradiated surface damage on fused silica
Author(s): Shizhen Xu; Xiaodong Yuan; Wanguo Zheng; Xiaotao Zu; Haibin Lv; Xiaodong Jiang; Haijun Wang; Jin Huang
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The dynamics of 355-nm laser ablation on fused silica were studied by instantaneous scattering pulse measurement and a time-resolved shadowgraph imaging. The sharp increase of scattered light of pumped pulse is assumed to be the damage precursor, therefore, the damage start nearly at the peak of the pumped pulse. The plasmas flash due to ion-electron recombination occurred about 21ns after the peak of pumped pulses. The propagating shock wave and ejected material to the air were imaged by shadowgraphic technology. The damage process of fused silica under UV laser ablation was also discussed.

Paper Details

Date Published: 14 November 2007
PDF: 5 pages
Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67220M (14 November 2007); doi: 10.1117/12.782853
Show Author Affiliations
Shizhen Xu, China Academy of Engineering Physics (China)
Univ. of Electronic Science and Technology of China (China)
Xiaodong Yuan, China Academy of Engineering Physics (China)
Wanguo Zheng, China Academy of Engineering Physics (China)
Xiaotao Zu, Univ. of Electronic Science and Technology of China (China)
Haibin Lv, China Academy of Engineering Physics (China)
Xiaodong Jiang, China Academy of Engineering Physics (China)
Haijun Wang, China Academy of Engineering Physics (China)
Jin Huang, China Academy of Engineering Physics (China)


Published in SPIE Proceedings Vol. 6722:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

© SPIE. Terms of Use
Back to Top