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Proceedings Paper

Nanolithography in evanescent near field by using nano-filmed noble metal layers
Author(s): Yong Yang; Song Hu; Hanmin Yao; Guanxiao Cheng; Wei Yan
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Paper Abstract

Nanolithography has been investigated by using optical proximity exposure in the evanescent near field in nano-filmed noble metals. Sub-diffraction-limited feature size can be resolved by using i-line illumination exposure. Compared with the model of original superlens, we separated the superlens 100nm away from the mask, under the illumination of i-line light, the initial simulation shows that the sub-diffraction-limited feature as small as 60nm linewidth with 120nm pitch can be clearly resolved without hard contact between mask and nano-filmed noble metal. By proper design of the materials and the parameters of nano-filmed layers, better resolution can be realized.

Paper Details

Date Published: 21 November 2007
PDF: 6 pages
Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 67241A (21 November 2007); doi: 10.1117/12.782841
Show Author Affiliations
Yong Yang, Institute of Optics and Electronics (China)
Graduate School of the Chinese Academy of Sciences (China)
Song Hu, Institute of Optics and Electronics (China)
Hanmin Yao, Institute of Optics and Electronics (China)
Guanxiao Cheng, Institute of Optics and Electronics (China)
Graduate School of the Chinese Academy of Sciences (China)
Wei Yan, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 6724:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Sen Han; Tingwen Xing; Yanqiu Li; Zheng Cui, Editor(s)

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