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Proceedings Paper

Novel algorithm for modeling aberration-induced overlay in lithographic process
Author(s): Fan Wang; Mingying Ma; Lifeng Duan; Xiangzhao Wang
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Paper Abstract

As critical dimension shrinks, overlay error induced by wavefront aberration of projection lens in lithographic tools has become a serious problem. In the present paper, we introduce a novel algorithm for modeling aberration-induced overlay in the lithographic process. The calculation results of the algorithm show good correlation with that of PROLITH, the widely used simulation program employing the vector model. And the calculating time is reduced to less than 10% with the algorithm.

Paper Details

Date Published: 30 November 2007
PDF: 8 pages
Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 67240O (30 November 2007); doi: 10.1117/12.782679
Show Author Affiliations
Fan Wang, Shanghai Micro Electronics Equipment Co. Ltd. (China)
Mingying Ma, Shanghai Micro Electronics Equipment Co. Ltd. (China)
Lifeng Duan, Shanghai Micro Electronics Equipment Co. Ltd. (China)
Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 6724:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Sen Han; Tingwen Xing; Yanqiu Li; Zheng Cui, Editor(s)

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