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Proceedings Paper

Design and process of low loss bend waveguide of integrated optical gyroscope
Author(s): Xiang Ji; Hengwei Zhang; Guoguang Yang; Xiaomin Liu; Gang Lei
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Paper Abstract

The most important technology of IIOG is to fabricate low loss waveguide reciprocal structure. This is studied in my article by analyzing the theory and experimental results in practice, introducing an offset at the junction of two waveguides, etching groove at the outer edge of bend waveguide and using waveguide lens effect to decrease bend loss. In experiment the photolithography of thick photoresist and reaction ion etching (RIE) process are studied for waveguide grooves with aspect ratio 1:1. The relevant process of figure's wideninging is discussed in theory and experiment, including mask, photoresist, exposure, development, temperature effect and quadratic effect. The effective minishing techniques are put forward such as spinning coat more times, minishing buds, baking and etching at low temperature and optical stabilization. The RIE process is studied for waveguide grooves too. Grassy prominence, the key reason for bad figure's roughness, is particularly discussed. The effective removaling techniques are also performed in practice, such as photoresist optical stabilization, incidence angle's adjustment and etching gas pressure alternation. It's beneficial to etching low loss waveguide.

Paper Details

Date Published: 28 November 2007
PDF: 15 pages
Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 672409 (28 November 2007); doi: 10.1117/12.782494
Show Author Affiliations
Xiang Ji, People's Liberation Army (China)
Hengwei Zhang, People's Liberation Army (China)
Guoguang Yang, Zhejiang Univ. (China)
Xiaomin Liu, Zhejiang Univ. (China)
Gang Lei, People's Liberation Army (China)


Published in SPIE Proceedings Vol. 6724:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Sen Han; Tingwen Xing; Yanqiu Li; Zheng Cui, Editor(s)

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