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Proceedings Paper

Magnetic field for efficient exhaustion of CO2 laser-produced Sn plasma in EUV light source
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Paper Abstract

We are developing a laser produced plasma light source for high volume manufacturing (HVM) EUV lithography. The light source is based on a high power, high repetition rate CO2 laser (10.6μm) system, a tin (Sn) target and a magnetic ion guiding for Sn treatment. We evaluated the characteristics of Sn debris generated by a CO2 laser produced plasma. Experiments were performed with bulk Sn-plate targets and Mo/Si multilayer mirror samples were used for debris analysis. We observed very thin and uniform Sn layers of nano/sub-nano size debris particles. The layer deposition rate at 120mm from the plasma is, without magnetic field, about 30nm per million shots. The fast Sn ion flux was measured with Faraday cups and the signal decreased by more than 3 orders of magnitude on application of a magnetic field of 1T. The Sn deposition on the Mo/Si multilayer mirror decreased in small magnetic field space by a factor of 5. In a large magnetic field space, the effectiveness of the magnetic guiding of Sn ions is examined by monitoring the fast Sn ions. The ion flux from a Sn plasma was confined along the magnetic axis with a maximum magnetic field of 2T.

Paper Details

Date Published: 12 May 2008
PDF: 9 pages
Proc. SPIE 7005, High-Power Laser Ablation VII, 70052U (12 May 2008); doi: 10.1117/12.782475
Show Author Affiliations
Yoshifumi Ueno, Extreme Ultraviolet Lithography System Development Association (Japan)
Georg Soumagne, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Suganuma, Extreme Ultraviolet Lithography System Development Association (Japan)
Takayuki Yabu, Extreme Ultraviolet Lithography System Development Association (Japan)
Masato Moriya, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Komori, Extreme Ultraviolet Lithography System Development Association (Japan)
Tamotsu Abe, Extreme Ultraviolet Lithography System Development Association (Japan)
Akira Endo, Extreme Ultraviolet Lithography System Development Association (Japan)
Akira Sumitani, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 7005:
High-Power Laser Ablation VII
Claude R. Phipps, Editor(s)

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