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Proceedings Paper

Development of an experimental EUVL system
Author(s): Chun-shui Jin; Li-Ping Wang; Li-Chao Zhang; Qiang Lin; Shu Pei; Jian-Lin Cao
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Paper Abstract

An experimental EUVL system has been developed to investigate EUV imaging system design, component fabrication, assembly technique and experimental process. The system includes a laser produced plasma (LPP) source, an ellipsoidal condenser, a transmission mask, a reduced projection optics, and vacuum system. We designed a 10:1 reduction projection optics using Schwarzschild system with spherical mirrors to achieve 0.1μm resolution. The Schwarzschild optics coated with Mo/Si multilayers was assembled with wavefront error (WFE) of 0.014 waves RMS at 632.8nm wavelength under computer-aided alignment method. Using this system a fine pattern of less than 0.25μm covering a 0.1mm diameter image field of view was clearly replicated on resist-coated wafer.

Paper Details

Date Published: 28 November 2007
PDF: 6 pages
Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 672408 (28 November 2007); doi: 10.1117/12.782464
Show Author Affiliations
Chun-shui Jin, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Li-Ping Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of the Chinese Academy of Sciences (China)
Li-Chao Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of the Chinese Academy of Sciences (China)
Qiang Lin, Graduate School of the Chinese Academy of Sciences (China)
Shu Pei, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Jian-Lin Cao, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 6724:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Sen Han; Tingwen Xing; Yanqiu Li; Zheng Cui, Editor(s)

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