Share Email Print

Proceedings Paper

Breaking the limits: combination of electron beam lithography and nanoimprint lithography for production of next-generation magnetic media and optical media
Author(s): Babak Heidari; Marc Beck
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The increased requirement e.g. resolution in multimedia displays creates the need for more storage capacity in both optical discs as well as hard drives. Blu-Ray-ROM and particularly future optical media formats require the employment of new lithography technologies. Today's magnetic media technology is facing difficulties to continue to higher surface densities and larger capacities due to the superparamagnetic limit. By using isolated magnetic domains to store the data, making it possible to get beyond 500 Gbits/in2 densities. The approach we describe uses a unique direct-write electron beam lithography system for lithography on a rotating substrate and creates a patterned master disc, which can be used as a mold in replication of final disks by imprint lithography. The imprint process replicates the original pattern with an exceptionally fast turn around time, making mass production of optical and magnetic media possible. However, realization of these new technologies offers challenges in implementation.

Paper Details

Date Published: 20 March 2008
PDF: 5 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 692103 (20 March 2008); doi: 10.1117/12.782461
Show Author Affiliations
Babak Heidari, Obducat AB (Sweden)
Marc Beck, Obducat AB (Sweden)

Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

© SPIE. Terms of Use
Back to Top