Share Email Print

Proceedings Paper

Improved micro topography measurement by LCoS-based fringe projection and z-stitching
Author(s): X. Schwab; C. Kohler; K. Körner; N. Eichhorn; W. Osten
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Fringe projection is a commonly used method for 3D surface metrology. Numerous applications have demonstrated a measurement field from a few millimeters to several meters. To enable the measurement of micro systems with this method, a zoom stereo microscope from Leica was used as the basis for the implementation of a fringe projection microscope. A state of the art twisted nematic WUXGA LCD was used for flexible fringe generation. The high fill factor of this reflective LCoS in combination with a 500 Lumen LED and a 12 bit CCD camera delivers fringe patterns with high contrast. This allows us to measure objects with both a strong reflectivity variation and a low reflectivity. The second main objective was to increase the measurement field and the depth of field. Using the zoom system and exchangeable microscope objectives, the measurement fields could be changed quickly from 4 cm2 to less than 1 mm2. Depending on the measurement field, the depth of field was between 5.22 mm and 0.018 mm. However, this was often not sufficient to measure the complete depth of a 3D-object. The microscope system also features an integrated high precision motor stage, which is already used for system calibration. Based on this, we implemented a new z-stitching method where n measurements at different well determined z-positions of the motor stage were performed. The n resulting topography maps can be stitched together to get the complete depth map of the entire object. Thus the depth measurement range is only limited by the mechanics of the z-stage.

Paper Details

Date Published: 26 April 2008
PDF: 10 pages
Proc. SPIE 6995, Optical Micro- and Nanometrology in Microsystems Technology II, 69950Q (26 April 2008); doi: 10.1117/12.781822
Show Author Affiliations
X. Schwab, Univ. Stuttgart (Germany)
C. Kohler, Univ. Stuttgart (Germany)
K. Körner, Univ. Stuttgart (Germany)
N. Eichhorn, GEFASOFT Automatisierung und Software GmbH (Germany)
W. Osten, Univ. Stuttgart (Germany)

Published in SPIE Proceedings Vol. 6995:
Optical Micro- and Nanometrology in Microsystems Technology II
Christophe Gorecki; Anand Krishna Asundi; Wolfgang Osten, Editor(s)

© SPIE. Terms of Use
Back to Top