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Proceedings Paper

Dual-wavelength digital holographic microscopy with sub-nanometer axial accuracy
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Paper Abstract

We present dual-wavelength Digital Holographic Microscopy (DHM) measurements on a certified 8.9 nm high Chromium thin step sample and demonstrate sub-nanometer axial accuracy. We introduce a modified DHM Reference Calibrated Hologram (RCH) reconstruction algorithm taking into account amplitude contributions. By combining this with a temporal averaging procedure and a specific dual-wavelength DHM arrangement, it is shown that specimen topography can be measured with an accuracy, defined as the axial standard deviation, reduced to at least 0.9 nm. Indeed, it is reported that averaging each of the two wavefronts recorded with real-time dual-wavelength DHM can provide up to 30% spatial noise reduction for the given configuration, thanks to their non-correlated nature.

Paper Details

Date Published: 25 April 2008
PDF: 9 pages
Proc. SPIE 6995, Optical Micro- and Nanometrology in Microsystems Technology II, 699503 (25 April 2008); doi: 10.1117/12.781263
Show Author Affiliations
Jonas Kühn, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
Florian Charrière, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
Tristan Colomb, DP-CHUV (Switzerland)
Frédéric Montfort, Lyncée Tec SA (Switzerland)
Etienne Cuche, Lyncée Tec SA (Switzerland)
Yves Emery, Lyncée Tec SA (Switzerland)
Pierre Marquet, DP-CHUV (Switzerland)
Christian Depeursinge, Ecole Polytechnique Fédérale de Lausanne (Switzerland)

Published in SPIE Proceedings Vol. 6995:
Optical Micro- and Nanometrology in Microsystems Technology II
Christophe Gorecki; Anand Krishna Asundi; Wolfgang Osten, Editor(s)

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