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Proceedings Paper

Development features in large-range nanoscale coordinate metrology
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Paper Abstract

The Nanometer-Coordinate-Measuring-Machine (NCMM) has the ability to scan large areas at nanometer resolution for the purpose of quality assurance of nanostructured products. The device combines a conventional atomic force microscope (AFM) with a precise positioning system. By locating the AFM at a fixed point and moving the sample with the positioning system a scan range of 2.5 x 2.5 x 0.5 cm3 and a repeatability of 0.1 nm is achieved. Since all movements of the positioning system are measured via laser interferometers, the Abbe-principle is kept in every dimension, the use of materials with a low thermal expansion coefficient (like Zerodur and FeNi36) and an overall coordinate system the system provides unique measurement conditions (traceability to the meter definition; repeatable and fast scans of the region of interest). In the past the NCMM was used to make the first large area scan of a microelectronic sample. Our present work focuses on automating critical dimension measurement through the use of a-priori-knowledge of the sample and optical navigation. A-priori-knowledge can be generated by the use of CAD-Data of the sample or scans with white light interferometry. Another present objective is the optimization of the measurement parameters for specific sample topologies using simulation and also empirical methods like the Ziegler-Nichols method. The need of efficient data processing and handling is also part of our current research.

Paper Details

Date Published: 25 April 2008
PDF: 12 pages
Proc. SPIE 6995, Optical Micro- and Nanometrology in Microsystems Technology II, 69950B (25 April 2008); doi: 10.1117/12.780821
Show Author Affiliations
Martin Gruhlke, Helmut-Schmidt Univ. (Germany)
Christian Recknagel, Helmut-Schmidt Univ. (Germany)
Hendrik Rothe, Helmut-Schmidt Univ. (Germany)

Published in SPIE Proceedings Vol. 6995:
Optical Micro- and Nanometrology in Microsystems Technology II
Christophe Gorecki; Anand Krishna Asundi; Wolfgang Osten, Editor(s)

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