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Proceedings Paper

22 nm node contact hole formation in extreme ultra-violet lithography
Author(s): Eun-Jin Kim; Kwan-Hyung Kim; Hyeong-Ryeol Park; Jun-Yeob Yeo; Jai-Soon Kim; Hye-Keun Oh
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Paper Abstract

Patterning of contact hole is always the most difficult process among many types of pattern formations. Specially for the Extreme Ultra-Violet Lithography (EUVL), it will be even more difficult to make perfectly circled contact hole due to the shadow effect. The shape of contact hole will be elliptical because the vertical axis opening is different from the horizontal axis opening. We studied this behavior for 22 nm node contact hole patterns. We varied the pitch of the regular contact hole array. The dependency of the position and density is studied for the random array. In addition to that the thickness of the absorber and the reflectivity of the multilayer are varied to see non-circular contact hole. In order to make desired circular contact hole with uniform width, direction dependent mask bias is applied in addition to the normal optical proximity correction.

Paper Details

Date Published: 25 March 2008
PDF: 8 pages
Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69223X (25 March 2008); doi: 10.1117/12.780242
Show Author Affiliations
Eun-Jin Kim, Hanyang Univ. (South Korea)
Kwan-Hyung Kim, Seoul National Univ. (South Korea)
Hyeong-Ryeol Park, Seoul National Univ. (South Korea)
Jun-Yeob Yeo, Seoul National Univ. (South Korea)
Jai-Soon Kim, Seoul National Univ. (South Korea)
Hye-Keun Oh, Hanyang Univ. (South Korea)


Published in SPIE Proceedings Vol. 6922:
Metrology, Inspection, and Process Control for Microlithography XXII
John A. Allgair; Christopher J. Raymond, Editor(s)

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