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Proceedings Paper

Photonic wires sidewall roughness measures using atomic force microscope capabilities
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Paper Abstract

Within the last years, interest in photonic wires and photonic crystals grew due to their demonstrated ability of controlling light propagation and characteristics. One of the limitations of such devices is due to the induced roughness during the fabrication process. Generally, an increase in roughness leads to loss increase thus limiting the propagation length and postponing the commercialization of such structures. In this paper we present a new algorithm for measuring the sidewall roughness of our devices based on atomic force microscope (AFM) approach. Using this algorithm, the roughness can be quantified and thus actions in decreasing it can be taken improving the device's performance.

Paper Details

Date Published: 25 April 2008
PDF: 6 pages
Proc. SPIE 6995, Optical Micro- and Nanometrology in Microsystems Technology II, 69950R (25 April 2008); doi: 10.1117/12.778874
Show Author Affiliations
Radu Malureanu, Technical Univ. of Denmark (Denmark)
Lars Hagedorn Frandsen, Technical Univ. of Denmark (Denmark)

Published in SPIE Proceedings Vol. 6995:
Optical Micro- and Nanometrology in Microsystems Technology II
Christophe Gorecki; Anand Krishna Asundi; Wolfgang Osten, Editor(s)

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