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Proceedings Paper

Application of solid phase direct write (SPDW) via scanning force microscopy for electrical devices and sensors
Author(s): Patrick S. Spinney; Scott D. Collins; Rosemary L. Smith
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Paper Abstract

Solid phase direct-write (SPDW) patterning is a promising technique for nanoscale device fabrication. It enables the deposition of a range of materials with the precision and relatively low cost inherent in scanning force microscopy. The ability to deposit controlled 2D and 3D patterns at the nanometer scale and image them with the same instrument adds versatility to nanodevice design and fabrication. This technique works by loading an atomic force microscopy tip with a solid phase "ink" then reversing the process to write a pattern. Linewidths between 40nm and 500nm can be written, with the dimension varied by user specified parameters. To date, four materials have been successfully deposited: carbon, silicon, tungsten oxide and molybdenum oxide. This report presents an overview of SPDW and its application to the direct write fabrication of electronic devices.

Paper Details

Date Published: 30 April 2008
PDF: 8 pages
Proc. SPIE 6959, Micro (MEMS) and Nanotechnologies for Space, Defense, and Security II, 69590J (30 April 2008); doi: 10.1117/12.777809
Show Author Affiliations
Patrick S. Spinney, Univ. of Maine (United States)
Scott D. Collins, Univ. of Maine (United States)
Rosemary L. Smith, Univ. of Maine (United States)


Published in SPIE Proceedings Vol. 6959:
Micro (MEMS) and Nanotechnologies for Space, Defense, and Security II
Thomas George; Zhongyang Cheng, Editor(s)

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