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Proceedings Paper

Modeling the work piece charging during e-beam lithography
Author(s): Benjamin Alles; Eric Cotte; Bernd Simeon; Timo Wandel
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Paper Abstract

Nowadays, high end photomasks are usually patterned with electron beam writers since they provide a superior resolution. However, placement accuracy is severely limited by the so-called charging effect: Each shot with the electron beam deposits charges inside the mask blank which deflect the electrons in the subsequent shots and therefore cause placement errors. In this paper, a model is proposed which allows to establish a prediction of the deflection of the beam and thus provide a method for improving pattern placement for photomasks.

Paper Details

Date Published: 7 March 2008
PDF: 10 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69244P (7 March 2008); doi: 10.1117/12.776651
Show Author Affiliations
Benjamin Alles, TU München (Germany)
Eric Cotte, Advanced Mask Technology Ctr. (Germany)
Bernd Simeon, TU München (Germany)
Timo Wandel, Advanced Mask Technology Ctr. (Germany)

Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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