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Proceedings Paper

More on practical solutions to eliminate reticle haze and extend reticle life in the production environment: specially designed RSPs, internal POD purifiers, and XCDA purged reticle stockers
Author(s): William Goodwin; Matt Welch; Bruce Laquidara; Oleg Kishkovich; A. Habecker
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Paper Abstract

Use of specially designed reticle SMIF pods (RSPs) - with unique purge flow, internal dual-capture mechanism purifiers and an ultra-low humidity CDA purging system- have provided a practical solution to eliminate reticle haze for the useful life of the reticle in production environments. Prior publications, Kishkovich et al., described newly understood mechanisms of reticle haze formation based on chemical modification of quartz and chrome surfaces and have proposed solutions based on continual purge of the reticle environment with ultra-low humidity purified air [1]. In further publications they reported successful application of this solution in the field on single reticle-pod purge systems. [2] In this paper we provide guidance and advice for high volume manufacturing haze control practitioners, describing some challenges and solutions implemented on reticle stocker equipment, including considerations for materials of construction, purge flow levels and regulation, in-pod moisture/chemical purifiers, and on-tool flow measurement techniques.

Paper Details

Date Published: 1 April 2008
PDF: 10 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69244N (1 April 2008); doi: 10.1117/12.775850
Show Author Affiliations
William Goodwin, Entegris, Inc. (United States)
Matt Welch, Entegris, Inc. (United States)
Bruce Laquidara, Entegris, Inc. (United States)
Oleg Kishkovich, Entegris, Inc. (United States)
A. Habecker, Dynamic Micro Systems (United States)


Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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