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Proceedings Paper

Extracting dose and focus from critical dimension data: optimizing the inverse solution
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Paper Abstract

We present a summary of various methods for inverting top and bottom critical dimension (CD) data to extract dose and focus information. We explain analytical, numerical, and library inversion techniques in detail, and explore their relative merits for the purposes of online and offline focus monitoring use models. We also detail the modeling requirements associated with each inversion technique, and -- for cases where the model form is flexible -- present a cross-validation methodology for optimizing the response model to fit experimental data. We present modeling and inversion results from seven exemplary photolithography processes, and study the results from each methodology in detail. While each method has its own set of advantages and disadvantages, we show that the library method represents the optimum choice to satisfy a variety of use models while minimizing cost.

Paper Details

Date Published: 22 March 2008
PDF: 11 pages
Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 692209 (22 March 2008); doi: 10.1117/12.775441
Show Author Affiliations
Kevin R. Lensing, Advanced Micro Devices, Inc. (United States)
J. Broc Stirton, Advanced Micro Devices, Inc. (United States)
Siddharth Chauhan, Advanced Micro Devices, Inc. (United States)


Published in SPIE Proceedings Vol. 6922:
Metrology, Inspection, and Process Control for Microlithography XXII
John A. Allgair; Christopher J. Raymond, Editor(s)

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