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Proceedings Paper

Layout patterning check for DFM
Author(s): C. C. Chang; I. C. Shih; J. F. Lin; Y. S. Yen; C. M. Lai; W. C. Huang; R. G. Liu; Y. C. Ku
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Paper Abstract

Design rules and the design rule check (DRC) utility are conventional approaches to design for manufacturability (DFM). The DRC utility is based on unsophisticated rules to check the design layout in a simple environment. As the design dimension shrinks drastically, the introduction of a more powerful DFM utility with model-based layout patterning check (LPC) becomes mandatory for designers to filter process weak-points before taping out layouts. In this paper, a system of integrated hotspot scores consisting of three lithography sensitive indexes is proposed to assist designers to circumvent risky layout patterns in lithography. With the hotspot fixing guideline and the hotspot severity classification deduced from the scoring system provided in this paper, designers can deliver much more manufacturable designs.

Paper Details

Date Published: 19 March 2008
PDF: 7 pages
Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 69251R (19 March 2008); doi: 10.1117/12.775420
Show Author Affiliations
C. C. Chang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
I. C. Shih, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
J. F. Lin, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Y. S. Yen, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
C. M. Lai, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
W. C. Huang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
R. G. Liu, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Y. C. Ku, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 6925:
Design for Manufacturability through Design-Process Integration II
Vivek K. Singh; Michael L. Rieger, Editor(s)

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