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Proceedings Paper

Nano patterning with a single high-transmission nano-metal aperture system
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Paper Abstract

We design a C-shaped aperture which overcomes the diffraction limit of light to produce a high-brightness nano-size light spot. For optical nano lithography, we construct a nano patterning system using an optical probe which adopts a solid immersion lens (SIL), the 120 nm thickness aluminum film on the bottom surface of the SIL and the C-shaped aperture engraved in the metal film. Light source is a diode laser of 405nm wavelength to expose h-line photoresist(PR). A linear stage holding the optical probe makes the nano aperture contact with the PR coated on silicon wafer. Using this patterning system, we obtain sub 100nm array patterns and measure the system performance in various exposure conditions to verify the feasibility of plasmonic lithography.

Paper Details

Date Published: 21 March 2008
PDF: 8 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69212C (21 March 2008); doi: 10.1117/12.774485
Show Author Affiliations
Yongwoo Kim, Yonsei Univ. (South Korea)
Sinjeung Park, Yonsei Univ. (South Korea)
Eungman Lee, Yonsei Univ. (South Korea)
Jae W. Hahn, Yonsei Univ. (South Korea)

Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

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