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Proceedings Paper

Evaluation of OPC test patterns using parameter sensitivity
Author(s): Brian S. Ward
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Paper Abstract

Test pattern data set filtering based on the concept of parameter sensitivity is proposed to reduce OPC time-to-model requirements. The concept of parameter sensitivity-based filtering is discussed briefly, followed by a methodology to apply the filtering to test pattern sets prior to data measurement along with a number of potential data filtering algorithms. The proposed methodology is then applied to an experimental data set targeted for a 32nm logic process. Qualitative observations are made on the initial data filtering, followed by quantitative metrics based on best-fit models for each of the data filtering algorithms. Results demonstrate that a comparable model is achievable using the proposed data filtering methods and one of the filtering algorithms.

Paper Details

Date Published: 17 March 2008
PDF: 12 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69243S (17 March 2008); doi: 10.1117/12.774462
Show Author Affiliations
Brian S. Ward, IMEC (Belgium)


Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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