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Proceedings Paper

Film quantum yields of EUV and ultra-high PAG photoresists
Author(s): Elsayed Hassanein; Craig Higgins; Patrick Naulleau; Richard Matyi; Gregg Gallatin; Gregory Denbeaux; Alin Antohe; Jim Thackeray; Kathleen Spear; Charles Szmanda; Christopher N. Anderson; Dimitra Niakoula; Matthew Malloy; Anwar Khurshid; Cecilia Montgomery; Emil C. Piscani; Andrew Rudack; Jeff Byers; Andy Ma; Kim Dean; Robert Brainard
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Paper Abstract

Base titration methods are used to determine C-parameters for three industrial EUV photoresist platforms (EUV- 2D, MET-2D, XP5496) and twenty academic EUV photoresist platforms. X-ray reflectometry is used to measure the density of these resists, and leads to the determination of absorbance and film quantum yields (FQY). Ultrahigh levels of PAG show divergent mechanisms for production of photoacids beyond PAG concentrations of 0.35 moles/liter. The FQY of sulfonium PAGs level off, whereas resists prepared with iodonium PAG show FQYs that increase beyond PAG concentrations of 0.35 moles/liter, reaching record highs of 8-13 acids generated/EUV photons absorbed.

Paper Details

Date Published: 28 March 2008
PDF: 13 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69211I (28 March 2008); doi: 10.1117/12.774099
Show Author Affiliations
Elsayed Hassanein, Univ. at Albany (United States)
Craig Higgins, Univ. at Albany (United States)
Patrick Naulleau, Univ. at Albany (United States)
Richard Matyi, Univ. at Albany (United States)
Gregg Gallatin, Applied Math Solutions, LLC (United States)
Gregory Denbeaux, Univ. at Albany (United States)
Alin Antohe, Univ. at Albany (United States)
Jim Thackeray, Rohm and Haas Microelectronics (United States)
Kathleen Spear, Rohm and Haas Microelectronics (United States)
Charles Szmanda, Rohm and Haas Microelectronics (United States)
Christopher N. Anderson, Lawrence Berkeley National Lab. (United States)
Dimitra Niakoula, Lawrence Berkeley National Lab. (United States)
Matthew Malloy, SEMATECH (United States)
Anwar Khurshid, SEMATECH (United States)
Cecilia Montgomery, SEMATECH (United States)
Emil C. Piscani, SEMATECH (United States)
Andrew Rudack, SEMATECH (United States)
Jeff Byers, SEMATECH (United States)
Andy Ma, SEMATECH (United States)
Kim Dean, SEMATECH (United States)
Robert Brainard, Univ. at Albany (United States)


Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

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