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Proceedings Paper

Automated creation of production metrology recipes based on design information
Author(s): Jason P. Cain; Mark Threefoot; Kishan Shah; Bernd Schulz; Stefanie Girol-Gunia; Jon-Tobias Hoeft
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Paper Abstract

The volume of measurements and the complexity of metrology recipes in state-of-the-art semiconductor manufacturing have made the conventional manual process of creating the recipes increasingly problematic. To address these challenges, we implemented a system for automatically creating production metrology recipes. We present results from the use of this system for CD-SEM and overlay tools in a high-volume manufacturing environment and show that, in addition to the benefits of reduced engineering time and improved tool utilization, recipes produced by the automated system are in many respects more robust than the equivalent manually created recipes.

Paper Details

Date Published: 24 March 2008
PDF: 10 pages
Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69221J (24 March 2008); doi: 10.1117/12.773407
Show Author Affiliations
Jason P. Cain, Advanced Micro Devices, Inc. (United States)
Mark Threefoot, Advanced Micro Devices, Inc. (United States)
Kishan Shah, Advanced Micro Devices, Inc. (United States)
Bernd Schulz, AMD Fab36 LLC and Co. KG (Germany)
Stefanie Girol-Gunia, AMD Fab36 LLC and Co. KG (Germany)
Jon-Tobias Hoeft, AMD Fab36 LLC and Co. KG (Germany)


Published in SPIE Proceedings Vol. 6922:
Metrology, Inspection, and Process Control for Microlithography XXII
John A. Allgair; Christopher J. Raymond, Editor(s)

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