Share Email Print
cover

Proceedings Paper

Etch-less UV-NIL process for patterning photonic crystal structure onto OLED substrate
Author(s): Jun-ho Jeong; Sohee Jeon; Jongyoup Shim; Jae Ryoun Youn; Hyung-Dol Park; Jae-Wook Kang; Jang-Joo Kim; Ki-don Kim; Dae-geun Choi; Junhyuk Choi; Dong-Il Lee; Ali Ozhan Altun; Soon-won Lee; Eung-sug Lee; Se-Heon Kim; Yong-Hee Lee
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

An etch-less ultraviolet nanoimprint lithography (UV-NIL) process is proposed for patterning a photonic crystal (PC) structure onto an organic light-emitting diode (OLED) substrate. In a conventional UV-NIL, anisotropic etching is used to remove the residual layers and to transfer the patterns onto the substrate. The proposed process does not require an etching process. In the process, a stamp with nano-scale PC patterns is pressed on the dispensed resin and UV light is then exposed to cure the resin. After tens of seconds, the stamp is separated from the patterned polymer layer on the substrate. Finally, high-refractive index material is coated onto the layer. The refractive index of the polymer should be very similar to that of glass. The enhancement of the light extraction was assessed by the three-dimensional (3D) finite difference time domain (FDTD) method. The OLED was integrated on a nanoimprinted substrate and the electro-luminance intensity was found to have increased by as much as 50% compared to a conventional device.

Paper Details

Date Published: 20 March 2008
PDF: 8 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69212D (20 March 2008); doi: 10.1117/12.773301
Show Author Affiliations
Jun-ho Jeong, Korea Institute of Machinery and Materials (South Korea)
Sohee Jeon, Seoul National Univ. (South Korea)
Jongyoup Shim, Korea Institute of Machinery and Materials (South Korea)
Jae Ryoun Youn, Seoul National Univ. (South Korea)
Hyung-Dol Park, Seoul National Univ. (South Korea)
Jae-Wook Kang, Seoul National Univ. (South Korea)
Jang-Joo Kim, Seoul National Univ. (South Korea)
Ki-don Kim, Korea Institute of Machinery and Materials (South Korea)
Dae-geun Choi, Korea Institute of Machinery and Materials (South Korea)
Junhyuk Choi, Korea Institute of Machinery and Materials (South Korea)
Dong-Il Lee, Korea Institute of Machinery and Materials (South Korea)
Ali Ozhan Altun, Korea Institute of Machinery and Materials (South Korea)
Soon-won Lee, Korea Institute of Machinery and Materials (South Korea)
Eung-sug Lee, Korea Institute of Machinery and Materials (South Korea)
Se-Heon Kim, Korea Advanced Institute of Science and Technology (South Korea)
Yong-Hee Lee, Korea Advanced Institute of Science and Technology (South Korea)


Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

© SPIE. Terms of Use
Back to Top