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Proceedings Paper

Imaging performance optimization for hyper-NA scanner systems in high volume production
Author(s): Mark van de Kerkhof; Eelco van Setten; Andre Engelen; Vincent Plachecki; Hua-yu Liu; Emil Schmitt-Weaver; Wilbert Rooijakkers; Klaus Simon
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Paper Abstract

The introduction of lithographic systems with NA=1.35 has enabled the extension of optical lithography to 45 nm and below. At the same time, despite the larger NA, k1-factors have dropped to 0.3 and below. Defining the appropriate strategies for these high-end lithographic processes requires the integration and co-optimization of the design, mask and imaging parameters. This requires an in-depth understanding of the relevant parameters for imaging performance during high volume manufacturing. Besides the Critical Dimension Uniformity (CDU) budget for the baseline lithographic system, it is crucial to realize that system performance may vary over time in volume manufacturing. In this paper the CDU budget will be restated, with all the well-known contributors, and extended with some new terms, such as volume manufacturing effects. Experimental low-k1 results will be shown from NA=1.35 lithographic tools and compared to model-based predictions under realistic volume manufacturing circumstances. The combination of extreme NA and low k1 makes it necessary to introduce computational lithography for scanner optimization. The potential of using LithoCruiserTM and TachyonTM for optimising scanner source and OPC will be described. Also, using the fast scanner correction mechanisms to compensate for reticle, track and etch fingerprints and variations will be discussed.

Paper Details

Date Published: 7 March 2008
PDF: 13 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69241W (7 March 2008); doi: 10.1117/12.773260
Show Author Affiliations
Mark van de Kerkhof, ASML Netherlands B.V. (Netherlands)
Eelco van Setten, ASML Netherlands B.V. (Netherlands)
Andre Engelen, ASML Netherlands B.V. (Netherlands)
Vincent Plachecki, Brion Technologies (United States)
Hua-yu Liu, Brion Technologies (United States)
Emil Schmitt-Weaver, ASML Albany (United States)
Wilbert Rooijakkers, ASML Netherlands B.V. (Netherlands)
Klaus Simon, ASML Netherlands B.V. (Netherlands)

Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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