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Proceedings Paper

TEM validation of CD AFM image reconstruction: part II
Author(s): Gregory A. Dahlen; Hao-Chih Liu; Marc Osborn; Jason R. Osborne; Bryan Tracy; Amalia del Rosario
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Paper Abstract

The present paper is a continuation of an investigation to validate CD AFM image reconstruction using Transmission Electron Microscopy (TEM) as the Reference Metrology System (RMS). In the present work, the validation of CD AFM with TEM is extended to include a 26 nm diameter carbon nanotube (CNT) tip for non-reentrant feature scans. The use of DT (deep trench) mode and a CNT tip provides detailed bottom feature resolution and close mid-CD agreement with both TEM and prior CD mode AFM scans (using a high resolution Trident tip). Averaging AFM scan lines within the ~80 nm thickness region of the TEM sample is found to reduce systematic error with the RMS. Similarly, errors in alignment between AFM scan lines and TEM sample are corrected by a moving average method. Next, the NanoCD standard is used for complete 2D tip shape reconstruction (non-reentrant) utilizing its traceable feature width and well-defined upper-corner radius. The shape of the NanoCD is morphologically removed from the tip/standard image, thus providing the tip's shape with bounded dimensional uncertainty. Finally, an update of the measurement uncertainty budget for the current generation CD AFM is also presented, thus extending the prior work by NIST.

Paper Details

Date Published: 22 March 2008
PDF: 14 pages
Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69220K (22 March 2008); doi: 10.1117/12.773237
Show Author Affiliations
Gregory A. Dahlen, Thorleaf Research, Inc. (United States)
Hao-Chih Liu, Veeco Instruments, Inc. (United States)
Marc Osborn, Veeco Instruments, Inc. (United States)
Jason R. Osborne, Veeco Instruments, Inc. (United States)
Bryan Tracy, Spansion, Inc. (United States)
Amalia del Rosario, Spansion, Inc. (United States)


Published in SPIE Proceedings Vol. 6922:
Metrology, Inspection, and Process Control for Microlithography XXII
John A. Allgair; Christopher J. Raymond, Editor(s)

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