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Proceedings Paper

Monitoring polarization at 193nm high-numerical aperture with phase shift masks: experimental results and industrial outlook
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Paper Abstract

This paper will provide experimental results of Phase-Shift Mask (PSM) Polarimetry, a previously introduced resistbased polarization monitoring technique that employs a specialized chromeless phase-shifting test reticle. The patterns derived from high-NA proximity effects have proven to be 2 to 3 times more sensitive to polarization than a previously reported generation of patterns. Example results in this paper show that for a numerical aperture (NA) of 0.93, this technique is likely capable of measuring the intensity in the preferred polarization state (IPS) to within about 3%. Data from a follow-on reticle for NAs up to 1.35 is expected soon and promises to measure IPS to within about 1.5%. This is expected to suffice for monitoring polarization at the 22nm node for water-based immersion tools over time or from tool to tool. This technique is extendable and likely offers even greater sensitivity for high-index immersion lithography, should NAs greater than 1.35 become available. Advantages and disadvantages of this technique will be addressed.

Paper Details

Date Published: 12 March 2008
PDF: 9 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69241X (12 March 2008); doi: 10.1117/12.773123
Show Author Affiliations
Gregory McIntyre, IBM Advanced Lithography Research (United States)
Richard Tu, Benchmark Technologies (United States)

Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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