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Proceedings Paper

Determining DOF requirements needed to meet technology process assumptions
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Paper Abstract

Depth of Focus (DOF) and exposure latitude requirements have long been ambiguous. Techniques range from scaling values from previous generations to summing individual components from the scanner. Even more ambiguous is what critical dimension (CD) variation can be allowed to originate from dose and focus variation. In this paper we discuss a comprehensive approach to measuring focus variation that a process must be capable of handling. We also describe a detailed methodology to determine how much CD variation can come from dose and focus variation. This includes examples of the statistics used to combine individual components of CD, dose and focus variation.

Paper Details

Date Published: 7 March 2008
PDF: 9 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69241L (7 March 2008); doi: 10.1117/12.773070
Show Author Affiliations
Allen Gabor, IBM Systems and Technology Group (United States)
Andrew Brendler, IBM Systems and Technology Group (United States)
Bernhard Liegl, IBM Systems and Technology Group (United States)
Colin Brodsky, IBM Systems and Technology Group (United States)
Gerhard Lembach, AMD, Inc. (United States)
Scott Mansfield, IBM Systems and Technology Group (United States)
Shailendra Mishra, Chartered Semiconductor Mfg, Ltd. (United States)
Timothy Brunner, IBM Systems and Technology Group (United States)
Timothy Wiltshire, IBM Systems and Technology Group (United States)
Vinayan Menon, IBM Systems and Technology Group (United States)
Wai-kin Li, IBM Systems and Technology Group (United States)


Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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