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Proceedings Paper

Reflection control for line features of multiple pitches at hyper NA
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Paper Abstract

This study combines simulation and experiment to compare the impact that changing BARC thickness around some nominal value has on the resist profile, on an underlying reflective surface. Process window and profile effects are an important part of understanding how a BARC interacts with the resist's parameters to affect the latitude in the light of imperfect reflection control. Reflectivity simulations are made using MATLAB(r); and ProlithTM that show the effect of choosing refractive index and thickness in a multi-layer bottom anti-reflecting coating (BARC). Trends are identified for the better operating values for the index as well as specific values that meet the criterion for organic BARC in a front end application on a reflective substrate. Experimental profiles are compared to simulation using a calibrated resist model for nominal, better and ideal BARC stacks. Reflectivity, as a function of angle in resist, is convolved with the diffraction intensity distribution. This reflection, determined by a pitch's diffraction angle, identifies what can become problematic in setting up a process. Depolarization causes are discussed and while their impact affects image formation, there is little difference in reflection.

Paper Details

Date Published: 15 April 2008
PDF: 12 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69233X (15 April 2008); doi: 10.1117/12.772909
Show Author Affiliations
Michael Reilly, Rohm and Haas Electronic Materials (United States)
Michael Wagner, Rohm and Haas Electronic Materials (United States)
Warren Montgomery, SUNY, CNSE (United States)
Nick Pugliano, Rohm and Haas Electronic Materials (United States)
Stewart Robertson, KLA-Tencor (United States)


Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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