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Proceedings Paper

Ionic photo-acid generators containing functionalized semifluorinated sulfonates for high-resolution lithography
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Paper Abstract

To meet the challenges for resist materials raised by high resolution lithography technologies, tailor-made photoacid generators (PAGs) with controlled acid diffusion and improved miscibility with polymers are very important. We have developed new ionic PAGs containing functionalized semifluorinated sulfonates. These PAGs have excellent solubility in polymer matrices and common organic solvents, high thermal stability, high acid strength and low volatility of the generated acids, and make them attractive PAGs for high resolution lithography. In this contribution, the preparation and characterization of several new ionic PAGs, the influence of the host matrix on PAG properties, and a comparison of their lithographic performance are presented. Specifically their lithographic performance at EUV wavelength is discussed.

Paper Details

Date Published: 26 March 2008
PDF: 8 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69231B (26 March 2008); doi: 10.1117/12.772880
Show Author Affiliations
Yi Yi, Cornell Univ. (United States)
Ramakrishnan Ayothi, Cornell Univ. (United States)
Christopher K. Ober, Cornell Univ. (United States)
Wang Yueh, Intel Corp. (United States)
Heidi Cao, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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