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Proceedings Paper

Multi-patterning overlay control
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Paper Abstract

The extension of optical lithography to 32nm and beyond is dependent on double-patterning (DP) at critical levels. DP integration strategies result in added degrees of freedom for overlay variation. In particular, overlay control requires assessment of error among various mask/level combinations. The Blossom overlay metrology approach minimizes the size of the overlay marks associated with each mask/level while maximizing the density of marks within the overlay metrology tool's field of view (FOV). We examine Blossom enabled use cases in DP lithography control; specifically, within-field and multiple mask/level sampling.

Paper Details

Date Published: 17 March 2008
PDF: 5 pages
Proc. SPIE 6924, Optical Microlithography XXI, 692448 (17 March 2008); doi: 10.1117/12.772865
Show Author Affiliations
C. P. Ausschnitt, IBM Microelectronics Div. (United States)
P. Dasari, Nanometrics, Inc. (United States)

Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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