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Proceedings Paper

Optics characterization with compact EUV spectrophotometer
Author(s): H. Blaschke; I. Balasa; L. Koch; K. Starke; D. Ristau; C. Wies; R. Lebert; A. Bayer; F. Barkusky; K. Mann
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Paper Abstract

The development of a novel compact EUV spectrophotometer will be presented. The device is capable of measuring reflectance and transmittance spectra of medium scale EUV-optics primary in the spectral range from 12nm to 21nm. Based on a new polychromatic measurement principle, the system uses the direct irradiation of a table-top EUV-source for illuminating the sample and a broad-band spectrograph for detecting the probe and reference beam. Samples can be investigated under different angles of incidence and in respect of lateral dependencies. Typical results of reflectivity investigations of Mo/Si-mirrors and transmitting foils will be shown and compared with reference measurements of certified institutes and calculations.

Paper Details

Date Published: 16 April 2008
PDF: 9 pages
Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 692228 (16 April 2008); doi: 10.1117/12.772859
Show Author Affiliations
H. Blaschke, Laser Zentrum Hannover e.V. (Germany)
I. Balasa, Laser Zentrum Hannover e.V. (Germany)
L. Koch, Laser Zentrum Hannover e.V. (Germany)
K. Starke, Laser Zentrum Hannover e.V. (Germany)
D. Ristau, Laser Zentrum Hannover e.V. (Germany)
C. Wies, AIXUV Aachen (Germany)
R. Lebert, AIXUV Aachen (Germany)
A. Bayer, Laser-Lab. Göttingen e.V. (Germany)
F. Barkusky, Laser-Lab. Göttingen e.V. (Germany)
K. Mann, Laser-Lab. Göttingen e.V. (Germany)

Published in SPIE Proceedings Vol. 6922:
Metrology, Inspection, and Process Control for Microlithography XXII
John A. Allgair; Christopher J. Raymond, Editor(s)

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