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Proceedings Paper

Progress on Xe-DPP source development for alpha phase
Author(s): Masaki Yoshioka; Denis Bolshukhin; Guido Hergenhan; Jürgen Kleinschmidt; Vladimir Korobochko; Guido Schriever; Max C. Schürmann; Chinh Duc Tran; Christian Ziener
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Paper Abstract

EUVL source development at XTREME technologies benefits from the learning gained in previous developments for EUV Micro Exposure and Alpha Tools. Field data available from operation of these tools represent the basis for continuous improvement in core technology areas such as plasma generation and forming, component reliability, debris mitigation and optical performance. Results from integration and first operation of alpha tool sources are presented in the areas power performance, component lifetime and debris mitigation efficiency. The analysis results and simulation work of the realized EUV source concept are discussed and innovative concepts for component and module improvements are introduced. In term of intermediate focus power, 4W has been achieved. Moreover the factor of 1.6 higher IF power to previous results has been implied to demonstrate capability for the achievement of more than 5W. For the Beta-tool and HVM source generations a joint development work between XTREME technologies and Philips EUV is introduced. The related work is content of another presentation of this conference.

Paper Details

Date Published: 21 March 2008
PDF: 6 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69210U (21 March 2008); doi: 10.1117/12.772830
Show Author Affiliations
Masaki Yoshioka, XTREME technologies GmbH (Germany)
Denis Bolshukhin, XTREME technologies GmbH (Germany)
Guido Hergenhan, XTREME technologies GmbH (Germany)
Jürgen Kleinschmidt, XTREME technologies GmbH (Germany)
Vladimir Korobochko, XTREME technologies GmbH (Germany)
Guido Schriever, XTREME technologies GmbH (Germany)
Max C. Schürmann, XTREME technologies GmbH (Germany)
Chinh Duc Tran, XTREME technologies GmbH (Germany)
Christian Ziener, XTREME technologies GmbH (Germany)


Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

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