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Proceedings Paper

Anti-reflective coating for multipatterning lithography
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Paper Abstract

New bottom anti-reflective coatings (BARCs) have been developed that can be incorporated into multiple patterning schemes utilizing scanner-track-only processes. The BARCs have modifiable optical properties and can be removed during the resist development step. Several dual patterning schemes were investigated for trench printing. The most promising process produced 110 nm trenches with approximately 1:1 space ratios. The etch characteristics of these BARCs under fluorinated and oxygenated gases were determined.

Paper Details

Date Published: 26 March 2008
PDF: 7 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69230X (26 March 2008); doi: 10.1117/12.772827
Show Author Affiliations
Douglas J. Guerrero, Brewer Science, Inc. (United States)
Steve Gibbons, Brewer Science, Inc. (United States)
Joyce Lowes, Brewer Science, Inc. (United States)
Ramil Mercado, Brewer Science, Inc. (United States)


Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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