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Proceedings Paper

Using composite gratings for optical system characterization through scatterometry
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Paper Abstract

Timely process characterization is crucial in Design for Manufacturing. Scatterometry as a powerful metrology tool can be extended for optical system characterization. In this paper, we show how scatterometry can be used in conjunction with an array of dual-pitch or dual-bar gratings to measure optical aberrations. Multiple pattern designs are presented and compared. A linear model is used to describe the relation between aberration and measurable quantities. Firstprinciple simulation results shows the current approach can simultaneously measure various Zernike coefficients with accuracy ~2 mλ.

Paper Details

Date Published: 4 March 2008
PDF: 12 pages
Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 69251B (4 March 2008); doi: 10.1117/12.772785
Show Author Affiliations
Yu Ben, Univ. of California, Berkeley (United States)
Jing Xue, Univ. of California, Berkeley (United States)
Costas J. Spanos, Univ. of California, Berkeley (United States)


Published in SPIE Proceedings Vol. 6925:
Design for Manufacturability through Design-Process Integration II
Vivek K. Singh; Michael L. Rieger, Editor(s)

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