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Proceedings Paper

Double patterning down to k1=0.15 with bilayer resist
Author(s): Christoph Noelscher; Franck Jauzion-Graverolle; Marcel Heller; Matthias Markert; Bee-Kim Hong; Ulrich Egger; Dietmar Temmler
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Paper Abstract

Double patterning based on litho-etch-litho-etch techniques requires the fabrication of small lines or of small spaces after first patterning. If spacer techniques are used for pitch fragmentation small lines are needed as carrier in dense arrays. In any case the CD control is crucial. Focus of this paper is the patterning of small lines with bilayer resist in comparison with single layer resist as pre-requisite for both methods, for various litho conditions. The basic suitability of a bilayer patterning has been demonstrated at k1=0.146 at half pitch of 37.5nm with a sufficient process window and a good CD uniformity after litho and after etch. Single layer resists suffer from pattern collapse and resist thickness loss at defocus if a CD trim by litho "overexposure" is applied. This results in deficiency of masking during etch, although the resist profiles and litho process windows look perfect. If a CD trim is achieved by an etch process the CDU is diminished and the minimum patterned space is enlarged compared to bilayer, due the widening by trim etch. The bilayer resist for 193nm dry lithography showed convincing overall performance. First results with 193nm immersion bilayer look also promising but shows grass formation.

Paper Details

Date Published: 7 March 2008
PDF: 12 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69240Q (7 March 2008); doi: 10.1117/12.772750
Show Author Affiliations
Christoph Noelscher, Qimonda Dresden GmbH and Co. OHG (Germany)
Franck Jauzion-Graverolle, Qimonda Dresden GmbH and Co. OHG (Germany)
Marcel Heller, Qimonda Dresden GmbH and Co. OHG (Germany)
Matthias Markert, Qimonda Dresden GmbH and Co. OHG (Germany)
Bee-Kim Hong, Qimonda Dresden GmbH and Co. OHG (Germany)
Ulrich Egger, Qimonda Dresden GmbH and Co. OHG (Germany)
Dietmar Temmler, Qimonda Dresden GmbH and Co. OHG (Germany)

Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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