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Proceedings Paper

Proposal for determining exposure latitude requirements
Author(s): Harry J. Levinson; Yuansheng Ma; Marcel Koenig; Bruno La Fontaine; Rolf Seltmann
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Paper Abstract

To determine the magnitude of the exposure latitude required for a process to be manufacturable, additional factors are considered that have a similar relationship between linewidth variation and image log-slope. Such parameters include resist thickness, flare, post-exposure bake temperature, and line-edge roughness. To obtain consistency between theory and experiment it is necessary to use the resist-edge log-slope generalization of image log-slope. Inclusion of these additional factors increases the required exposure latitude five to six times more than would be considered necessary from exposure tool dose control alone.

Paper Details

Date Published: 1 April 2008
PDF: 10 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69241J (1 April 2008); doi: 10.1117/12.772711
Show Author Affiliations
Harry J. Levinson, Advanced Micro Devices (United States)
Yuansheng Ma, Advanced Micro Devices (United States)
Marcel Koenig, Advanced Micro Devices (Germany)
Bruno La Fontaine, Advanced Micro Devices (United States)
Rolf Seltmann, Advanced Micro Devices (Germany)

Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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