Share Email Print
cover

Proceedings Paper

Rapid directed self-assembly of Lamellar microdomains from a block copolymer containing hybrid
Author(s): Ho-Cheol Kim; Joy Cheng; Oun-Ho Park; Sang-Min Park; Ricardo Ruiz; Charles T. Black; Jed Pitera; Charles Rettner; Myron Flickner
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Material properties and directed self-assembly of a block copolymer containing hybrid material are presented in this paper. The hybrid material, which is a mixture of poly(styrene-b-ethylene oxide) (PS-b-PEO) and organosilicate (OS), shows morphologies of microdomains similar to those of organic diblock copolymers depending on the fraction of each phase, i.e. PS and PEO+OS. This material system shows very strong segregation between phases, which provides well defined microdomains in thin films even right after spin coating. The strong segregation also makes it possible to generate microdomains of sub-10 nm length scale regime. The hybrid is found to be directed self-assembly (DSA)- friendly, thus typical topographic and/or chemical guiding patterns can be used for DSA of the hybrid.

Paper Details

Date Published: 20 March 2008
PDF: 8 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 692129 (20 March 2008); doi: 10.1117/12.772684
Show Author Affiliations
Ho-Cheol Kim, IBM Almaden Research Ctr. (United States)
Joy Cheng, IBM Almaden Research Ctr. (United States)
Oun-Ho Park, IBM Almaden Research Ctr. (United States)
Sang-Min Park, IBM Almaden Research Ctr. (United States)
Ricardo Ruiz, Hitachi Global Storage Technologies, Inc. (United States)
Charles T. Black, Brookhaven National Lab. (United States)
Jed Pitera, IBM Almaden Research Ctr. (United States)
Charles Rettner, IBM Almaden Research Ctr. (United States)
Myron Flickner, IBM Almaden Research Ctr. (United States)


Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

© SPIE. Terms of Use
Back to Top