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Proceedings Paper

Extreme ultraviolet resist outgassing and its effect on nearby optics
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Paper Abstract

Extreme ultraviolet (EUV) photoresists are known to outgas during exposure to EUV radiation in the vacuum environment. This is of particular concern since some of the outgassed species may contaminate the nearby EUV optics and cause a loss of reflectivity and therefore throughput of the EUV exposure tools. Due to this issue, work has been performed to measure the species and quantities that outgas from EUV resists. Additionally, since the goal of these measurements is to determine the relative safety of various resists near EUV optics, work has been performed to measure the deposition rate of the outgassed molecules on Mo/Si-coated witness plate samples. The results for various species and tests show little measurable effect from resist components on optics contamination with modest EUV exposure doses.

Paper Details

Date Published: 28 March 2008
PDF: 7 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69211G (28 March 2008); doi: 10.1117/12.772670
Show Author Affiliations
Gregory Denbeaux, Univ. at Albany (United States)
Rashi Garg, Univ. at Albany (United States)
Chimaobi Mbanaso, Univ. at Albany (United States)
Justin Waterman, Univ. at Albany (United States)
Leonid Yankulin, Univ. at Albany (United States)
Alin Antohe, Univ. at Albany (United States)
Yu-Jen Fan, Univ. at Albany (United States)
Warren Montgomery, Univ. at Albany (United States)
Kim Dean, SEMATECH (United States)
Kevin Orvek, SEMATECH (United States)
Andrea Wüest, SEMATECH (United States)
Yayi Wei, Qimonda (United States)
Frank Goodwin, SEMATECH (United States)
Qimonda (United States)
Obert Wood, AMD (United States)
Chiew-Seng Koay, IBM (United States)
Eric Gullikson, Lawrence Berkeley National Lab. (United States)
Andy Aquila, Lawrence Berkeley National Lab. (United States)
Charles Tarrio, NIST (United States)
Steven Grantham, NIST (United States)
Saša Bajt, DESY (Germany)

Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

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