Share Email Print
cover

Proceedings Paper

Achieving small dimensions with an environmentally friendly solvent: photoresist development using supercritical CO2
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Dissolution rates of molecular glass photoresists in supercritical CO2 have been measured with the assistance of an interferometric dissolution rate monitor coupled to the supercritical CO2 vessel. Data show that fully protected polyphenolic molecular glass cores can show dissolution rates >500 nm/min depending on processing conditions. This extends to large branched structures and ring-type molecules approaching molecular weight 2000 g/mol. Molecular glass resists of this type that possess glass transition temperatures above 100oC can be patterned and developed in scCO2 with resolution <65 nm. Using these concepts, positive-tone photoresists based on acid-catalyzed decrosslinking reactions have also been developed. This represents the first report of intrinsically positive tone photoresists developable in pure scCO2.

Paper Details

Date Published: 4 April 2008
PDF: 11 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69233L (4 April 2008); doi: 10.1117/12.772635
Show Author Affiliations
Nelson M. Felix, Cornell Univ. (United States)
Anuja De Silva, Cornell Univ. (United States)
Jing Sha, Cornell Univ. (United States)
Christopher K. Ober, Cornell Univ. (United States)


Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

© SPIE. Terms of Use
Back to Top