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Proceedings Paper

Sn DPP source-collector modules: status of alpha resources, beta developments, and the scalability to HVM
Author(s): Marc Corthout; Rolf Apetz; Jesko Brudermann; Marcel Damen; Günther Derra; Oliver Franken; Jeroen Jonkers; Jürgen Klein; Felix Küpper; Arnaud Mader; Willi Neff; Hans Scheuermann; Guido Schriever; Max Schürmann; Guido Seimons; Rob Snijkers; Dominik Vaudrevange; Erik Wagenaars; Peiter van de Wel; Masaki Yoshioka; Peter Zink; Oliver Zitzen
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Paper Abstract

For industrial EUV (extreme ultra-violet) lithography applications high power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm, targeting 32 nm node and below. Philips Extreme UV GmbH and XTREME technologies GmbH have developed DPP (Discharge Produced Plasma) Alpha tools which run in operation at several locations in the world. In this paper the status of the Alpha Sn-DPP tools as developed by Philips Extreme UV GmbH will be given. The Alpha DPP tools provide a good basis for the development and engineering of the Beta tools and in the future of the HVM tools. The first Beta source has been designed and first light has been produced. Engineering steps will folow to optimize this first generation Beta Sn-DPP source. HVM tools target EUV power levels from 200W to 500W in IF. In this paper we show that the power requried for HVM can be generated with Sn-DPP sources. Based on Alpha Sn-DPP sources we show that repetition frequency and generated EUV pulse energy is scalable up to power levels that match the HVM requirements.

Paper Details

Date Published: 27 March 2008
PDF: 12 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69210V (27 March 2008); doi: 10.1117/12.772633
Show Author Affiliations
Marc Corthout, Philips Extreme UV GmbH (Germany)
Rolf Apetz, Philips Extreme UV GmbH (Germany)
Jesko Brudermann, XTREME Technologies GmbH (Germany)
Marcel Damen, Philips Extreme UV GmbH (Germany)
Günther Derra, Philips Research Labs. (Germany)
Oliver Franken, Fraunhofer Institut für Lasertechnik (Germany)
Jeroen Jonkers, Philips Extreme UV GmbH (Germany)
Jürgen Klein, Fraunhofer Institut für Lasertechnik (Germany)
Felix Küpper, Fraunhofer Institut für Lasertechnik (Germany)
Arnaud Mader, Philips Extreme UV GmbH (Germany)
Willi Neff, Fraunhofer Institut für Lasertechnik (Germany)
Hans Scheuermann, Philips Extreme UV GmbH (Germany)
Guido Schriever, XTREME Technologies GmbH (Germany)
Max Schürmann, XTREME Technologies GmbH (Germany)
Guido Seimons, Philips Extreme UV GmbH (Germany)
Rob Snijkers, Philips Extreme UV GmbH (Germany)
Dominik Vaudrevange, Philips Extreme UV GmbH (Germany)
Erik Wagenaars, Fraunhofer Institut für Lasertechnik (Germany)
Peiter van de Wel, Philips Extreme UV GmbH (Germany)
Masaki Yoshioka, XTREME Technologies GmbH (Germany)
Peter Zink, Philips Extreme UV GmbH (Germany)
Oliver Zitzen, Philips Extreme UV GmbH (Germany)


Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

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