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Proceedings Paper

EUV wavefront measurement of six-mirror optics using EWMS
Author(s): K. Sugisaki; M. Okada; K. Otaki; Y. Zhu; J. Kawakami; K. Murakami; C. Ouchi; M. Hasegawa; S. Kato; T. Hasegawa; H. Yokota; T. Honda; M. Niibe
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Paper Abstract

The wavefront measurements have been performed with the EUV Wavefront Metrology System (EWMS) for the first time using a prototype projection optic as a test optic. The wavefronts of the test optic was measured at the five positions in the exposure field with the Digital Talbot Interferometer (DTI). The RMS magnitude of the wavefront errors ranged from 0.71 λ (9.58 nm) to 1.67 λ (22.75 nm). The results obtained with the DTI were compared to those with the Cross Grating Lateral Shearing Interferometer (CGLSI). As a result of a repeatability assessment, it was found that the EWMS can stably measure the wavefronts of the test optic. Additionally, unwrapping of the phase map was found to be related to the precision of the measurement.

Paper Details

Date Published: 21 March 2008
PDF: 9 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69212U (21 March 2008); doi: 10.1117/12.772624
Show Author Affiliations
K. Sugisaki, EUVA (Japan)
M. Okada, EUVA (Japan)
K. Otaki, EUVA (Japan)
Y. Zhu, EUVA (Japan)
J. Kawakami, EUVA (Japan)
K. Murakami, EUVA (Japan)
C. Ouchi, EUVA (Japan)
M. Hasegawa, EUVA (Japan)
S. Kato, EUVA (Japan)
T. Hasegawa, EUVA (Japan)
H. Yokota, EUVA (Japan)
T. Honda, EUVA (Japan)
M. Niibe, Univ. of Hyogo (Japan)

Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

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