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Proceedings Paper

Scattering of EUV optics: substrate, coating, and degradation effects
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Paper Abstract

Scattering resulting from interface imperfections crucially affects the throughput and image contrast of EUV optics. Since both the substrate finish and the intrinsic thin film roughness influence the scattering, thorough investigations are needed to separate the different effects and to identify the most promising starting points for further optimizations. Mo/Si multilayer coatings deposited onto different substrates are investigated by utilizing an instrument for EUV reflectance and scattering measurements at 13.5 nm recently developed at the Fraunhofer IOF. The influences of the substrate finish and the deposition process onto the scattering are separated. Furthermore, the instrument allowed the EUV-induced degradation of Mo/Si mirrors to be investigated at the wavelength of application. In particular the impact of top-layer oxidation and roughening on the scattering properties is discussed.

Paper Details

Date Published: 21 March 2008
PDF: 8 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69212Q (21 March 2008); doi: 10.1117/12.772609
Show Author Affiliations
Sven Schröder, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Friedrich-Schiller-Univ. Jena (Germany)
Nicolas Benoit, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Torsten Feigl, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Angela Duparré, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Andreas Tünnermann, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Friedrich-Schiller-Univ. Jena (Germany)


Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

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