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Proceedings Paper

Challenges of non-PFOS top antireflective coating material
Author(s): Shu-Hao Hsu; Inge Vermeir; Matthias Scholze; Matthias Voigt; Janine Gierth; Armelle Mittermeier; Iris Mäge; Lars Voelkel
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Paper Details

Date Published: 26 March 2008
PDF: 9 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69232M (26 March 2008); doi: 10.1117/12.772600
Show Author Affiliations
Shu-Hao Hsu, Qimonda Dresden GmbH & Co. OHG (Germany)
Nanya Technology Corp. (Taiwan)
Inge Vermeir, Qimonda Dresden GmbH & Co. OHG (Germany)
Matthias Scholze, Qimonda Dresden GmbH & Co. OHG (Germany)
Matthias Voigt, Qimonda Dresden GmbH & Co. OHG (Germany)
Janine Gierth, Qimonda Dresden GmbH & Co. OHG (Germany)
Armelle Mittermeier, Qimonda Dresden GmbH & Co. OHG (Germany)
Iris Mäge, Qimonda Dresden GmbH & Co. OHG (Germany)
Lars Voelkel, Qimonda Dresden GmbH & Co. OHG (Germany)


Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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