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Proceedings Paper

Dependence of acid generation efficiency on acid molecular structure and concentration of acid generator in chemically amplified EUV resist
Author(s): Ryo Hirose; Takahiro Kozawa; Seiichi Tagawa; Toshiyuki Kai; Tsutomu Shimokawa
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Paper Abstract

The trade-off between resolution, sensitivity, and line edge roughness (LER) is the most serious problem for the development of sub-30 nm resists based on chemical amplification. Because of this trade-off, the increase in acid generation efficiency is essentially required for high resolution patterning with high sensitivity and low LER. Under such circumstances, the absorption coefficient and the acid generation efficiency are elemental key factors for the design of chemically amplified extreme ultraviolet (EUV) resist because the acid distribution in resist films is primarily determined by these two factors. In this study, we investigated the dependence of acid generation efficiency on the molecular structure and concentration of acid generators in chemically amplified EUV resists. The acid generation efficiency (the number of acid molecules generated by a single EUV photon) was obtained within the acid generator concentration range of 2-30 wt % for several kinds of ionic and nonionic acid generators.

Paper Details

Date Published: 26 March 2008
PDF: 9 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69232A (26 March 2008); doi: 10.1117/12.772569
Show Author Affiliations
Ryo Hirose, Osaka Univ. (Japan)
Takahiro Kozawa, Osaka Univ. (Japan)
Seiichi Tagawa, Osaka Univ. (Japan)
Toshiyuki Kai, JSR Corp. (Japan)
Tsutomu Shimokawa, JSR Corp. (Japan)


Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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