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Proceedings Paper

Improvements on the simulation of microscopic images for the defect detection of nanostructures
Author(s): Stephan Rafler; Thomas Schuster; Karsten Frenner; Wolfgang Osten; Uwe Seifert
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Paper Abstract

The optical defect identification on wafer still remains a useful tool, even if the structure sizes have the order of magnitude of the used wavelengths of the light and far beyond it. Structures are not resolved in this way, but one receives a contrast in the microscopic image of a defect with a certain illumination configuration. We show simulations of such images at structures relevant for practice and present methods to accelerate the computations. These accelerations can cause a loss of accuracy, but they can give hints to useful illumination configurations.

Paper Details

Date Published: 16 April 2008
PDF: 8 pages
Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 692215 (16 April 2008); doi: 10.1117/12.772498
Show Author Affiliations
Stephan Rafler, Institut für Technische Optik (Germany)
Thomas Schuster, Institut für Technische Optik (Germany)
Karsten Frenner, Institut für Technische Optik (Germany)
Wolfgang Osten, Institut für Technische Optik (Germany)
Uwe Seifert, Qimonda Dresden GmbH and Co. OHG (Germany)


Published in SPIE Proceedings Vol. 6922:
Metrology, Inspection, and Process Control for Microlithography XXII
John A. Allgair; Christopher J. Raymond, Editor(s)

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