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Proceedings Paper

Extended Nijboer-Zernike (ENZ) based mask imaging: efficient coupling of electromagnetic field solvers and the ENZ imaging algorithm
Author(s): Olaf T. A. Janssen; Sven van Haver; Augustus J. E. M. Janssen; Joseph J. M. Braat; H. Paul Urbach; Silvania F. Pereira
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Paper Abstract

Results are presented of mask imaging using the Extended Nijboer-Zernike (ENZ) theory of diffraction. We show that the efficiency of a mask imaging algorithm, derived from this theory, can be increased. By adjusting the basic Finite Difference Time Domain (FDTD) algorithm, we can calculate the near field of isolated mask structures efficiently, without resorting to periodic domains. In addition, the calculations for the points on the entrance sphere of the imaging system can be done separately with a Fourier transformed Stratton-Chu nearto- far-field transformation. By clever sampling in the radial direction of the entrance pupil, the computational effort is already reduced by at least a factor of 4.

Paper Details

Date Published: 7 March 2008
PDF: 9 pages
Proc. SPIE 6924, Optical Microlithography XXI, 692410 (7 March 2008); doi: 10.1117/12.772497
Show Author Affiliations
Olaf T. A. Janssen, Delft Univ. of Technology (Netherlands)
Sven van Haver, Delft Univ. of Technology (Netherlands)
Augustus J. E. M. Janssen, Philips Research Europe (Netherlands)
Joseph J. M. Braat, Delft Univ. of Technology (Netherlands)
H. Paul Urbach, Delft Univ. of Technology (Netherlands)
Silvania F. Pereira, Delft Univ. of Technology (Netherlands)

Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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