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Proceedings Paper

Spectroscopic ellipsometer for ultra thin film
Author(s): Kumiko Akashika; Shuji Shiota; Shinji Yamaguchi; Masahiro Horie; Masayoshi Kobayashi
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Paper Abstract

As semiconductor technology has advanced, the films have become thinner and changed to multi-layer films, such as gate dielectric construction. To deal with these trends, we are continuing development of our spectroscopic ellipsometer with elliptical polarization. We chose a Rotating-Analyzer Ellipsometer (RAE) configuration. The incident light in this type of device is usually polarized linearly, because polarizers do not disperse the light. But the incident light in the ellipsometer described in this paper is elliptical, which has a nearly circular polarization. In this paper, we introduce a technique for solving the dispersion problem.

Paper Details

Date Published: 26 March 2008
PDF: 5 pages
Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69223M (26 March 2008); doi: 10.1117/12.772414
Show Author Affiliations
Kumiko Akashika, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Shuji Shiota, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Shinji Yamaguchi, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Masahiro Horie, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Masayoshi Kobayashi, Dainippon Screen Manufacturing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 6922:
Metrology, Inspection, and Process Control for Microlithography XXII
John A. Allgair; Christopher J. Raymond, Editor(s)

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