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Proceedings Paper

High resolution nanoimprint templates for dual damascene: fabrication and imprint results
Author(s): Mathias Irmscher; Joerg Butschke; Ron Carpio; Brook Chao; Wei-Lun Jen; Corinna Koepernik; Lorenz Nedelmann; Jordan Owens; Frank Palmieri; Marcus Pritschow; Christian Reuter; Holger Sailer; Ken Satoodeh; Jeff Wetzel; Bruce Wilks; Grant Willson
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Paper Abstract

A dual damascene template fabrication process has been developed, which enables the structuring of high-resolution, high-aspect pillars on top of lines. Based on this technology templates with three different designs have been fabricated and characterized. Two templates are dedicated for an assessment of the fabrication process using a regular test design on one hand and an arbitrary CMOS design on the other hand. With the third template via chains shall be later realized as demonstrator for electrical tests. The templates have been imprinted in resist and sacrificial material on an Imprio 55 and an Imprio 100 tool. The usability of each fabricated template could be confirmed for the specific application. For the template manufacturing a Vistec variable shape e-beam (VSB) writer SB352HR and appropriate positive-tone and negative-tone chemically amplified resists (CAR) have been used.

Paper Details

Date Published: 26 March 2008
PDF: 12 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69210D (26 March 2008); doi: 10.1117/12.772295
Show Author Affiliations
Mathias Irmscher, IMS Chips (Germany)
Joerg Butschke, IMS Chips (Germany)
Ron Carpio, ATDF Inc. (United States)
Brook Chao, Univ. of Texas, Austin (United States)
Wei-Lun Jen, Univ. of Texas, Austin (United States)
Corinna Koepernik, IMS Chips (Germany)
Lorenz Nedelmann, IMS Chips (Germany)
Jordan Owens, ATDF Inc. (United States)
Frank Palmieri, Univ. of Texas, Austin (United States)
Marcus Pritschow, IMS Chips (Germany)
Christian Reuter, IMS Chips (Germany)
Holger Sailer, IMS Chips (Germany)
Ken Satoodeh, ATDF Inc. (United States)
Jeff Wetzel, ATDF Inc. (United States)
Bruce Wilks, ATDF Inc. (United States)
Grant Willson, Univ. of Texas, Austin (United States)

Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

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