Share Email Print
cover

Proceedings Paper

Synthesis of novel alpha-fluoroacrylates and related polymers for immersion lithography
Author(s): Tsuneo Yamashita; Takuji Ishikawa; Masamichi Morita; Takashi Kanemura; Hirokazu Aoyama
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Immersion lithography is being actively developed toward mass production for 55nm node devices and beyond. Advances are being made toward large depths of focus and higher resolution, but the underlying problem of machine and material cost increases remains. Our work over the past few years has shown that the main-chain fluorinated base resins realized by the co-polymerization of tetrafluoroethylene (TFE) and norbornene derivatives offer high dissolution rates and moderate surface properties. However, it is difficult to synthesis these materials and their high cost is disadvantageous. Recently, we switched our attention to &agr;-fluoroacrylate and have synthesized various monomers and polymers for immersion lithography. &agr;-fluoroacrylate has a polymerization rate faster than acrylate and methacrylate, and its polymers are superior to theirs. In this paper, we will report these synthesis methods and immersion specific properties such as the dissolution rate in standard alkaline solution and water contact angle. Furthermore, we consider with relationship between dissolution rate and polymer structure by infrared method.

Paper Details

Date Published: 4 April 2008
PDF: 7 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69231Z (4 April 2008); doi: 10.1117/12.772262
Show Author Affiliations
Tsuneo Yamashita, Daikin Industries, Ltd. (Japan)
Takuji Ishikawa, Daikin Industries, Ltd. (Japan)
Masamichi Morita, Daikin Industries, Ltd. (Japan)
Takashi Kanemura, Daikin Industries, Ltd. (Japan)
Hirokazu Aoyama, Daikin Industries, Ltd. (Japan)


Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

© SPIE. Terms of Use
Back to Top